Study the Structural Properties and Surface Morphology of CdO thin films prepared by Chemical Spray pyrolysis
DOI:
https://doi.org/10.31257/2018/JKP/2020/120201Keywords:
CdO , CSP , Structure properties , Surface MorphologyAbstract
CdO films were prepared using a chemical spray paralysis (CSP) method on the glass substrate at a temperature of 350 ° C and thickness (260 ± 15 nm), and study the effect time of annealing (0, 1, 1.5, 2, 2.5) h at a 450 °C annealing temperature On structural properties.
from X-ray diffraction pattern the results showed that all CdO thin films have a polycrystalline crystalline structure and a prevalent growth in the direction (111), and the average grain size (G) in this direction ranges (29.80 - 33.23) nm. It generally increases in value while the agitation values, extraction density, number of crystals decrease by increasing the time of annealing (1-2) h of thin films.
And from resulted of Atomic Force Microscope (AFM) the surface roughness , root mean square ( RMS ) and average grain size increase with increasing of annealing time, Expect for melting thin films at temperatures 450 ̊C and for the time of annealing 2.5h note decrease slightly may be the possibility of an occurrence the cracks- free of the thin films component.
Downloads
Downloads
Published
How to Cite
Issue
Section
Categories
License
Copyright (c) 2023 Karrar Mahdi Saleh
This work is licensed under a Creative Commons Attribution 4.0 International License.
Journal of Kufa-Physics is licensed under the Creative Commons Attribution 4.0 International License, which allows users to copy, to create extracts, abstracts, and new works from the Article, to alter and revise the Article, and to make commercial use of the Article (including reuse and/or resale of the Article by commercial entities), provided the user gives appropriate credit (with a link to the formal publication through the relevant DOI), provides a link to the license, indicates if changes were made and the licensor is not represented as endorsing the use made of the work. The authors hold the copyright for their published work on the JKP website, while KJP is responsible for appreciating citation for their work, which is released under CC-BY-4.0 enabling the unrestricted use, distribution, and reproduction of an article in any medium, provided that the original work is properly cited.